Have you filed a patent or utility model application in Spain or abroad?
Are you an innovative company or an independent inventor? Then this will interest you: the Spanish Patent and Trademark Office (OEPM) has opened its 2025 call for grant applications, aimed at helping you recover part of the official fees you’ve incurred.
Below, we explain what the grant covers, who is eligible, what expenses are included, and how to apply.
What is this grant about?
The OEPM partially subsidizes expenses related to official procedures before patent offices, through two separate programmes:
-
National programme: for Spanish patent and utility model applications.
-
International programme: for international applications (PCT, EPO, or foreign national offices).
You may apply for both programmes simultaneously, and they are compatible with other public or private aid.
Who can apply?
Eligible applicants include:
– Individual inventors
– Self-employed professionals
– Spanish SMEs
– Companies acting as applicants (if they have paid the fees, even if the invention belongs to someone else)
– Legal representatives or IP agents acting on behalf of the applicant
What expenses are covered in 2025?
– International Programme
Applies to inventions protected outside Spain. Only official fees are eligible for reimbursement:
Foreign or regional patent offices:
-
Filing a patent or utility model application
-
Validation of European patents (outside Spain)
-
Prior art search
-
Examination of the application
-
Grant of the patent
European Patent Office (EPO):
-
Designation of countries
-
Excess claims fees
-
Renewal fees prior to grant
PCT (when OEPM acts as receiving office or authority):
-
International PCT filing fee
-
International search fee (when OEPM acts as ISA)
-
International preliminary examination fee (when OEPM acts as IPEA)
– National Programme
Available only to SMEs and individuals filing applications before the OEPM.
Eligible expenses:
-
Filing a Spanish utility model
-
Requesting the Search Report (IET) for utility models
-
Filing a Spanish patent
-
IET for Spanish patents
-
Substantive examination of Spanish patents
How much can you receive?
The grant covers a fixed percentage of eligible expenses, based on predefined reference amounts.
For SMEs and individuals: up to 90%
For other cases: up to 80%
Important: The total aid must not exceed the maximum allowed under the EU de minimis regime: €300,000 per company over three fiscal years.
How do you apply?
Applications must be submitted entirely online through the OEPM’s electronic platform. One month from the date the announcement is published in the Official State Gazette (BOE).
You can access the official call via this link.
What documents are required?
Depending on whether you are an individual or a company, and whether you apply directly or through a representative, you must provide:
-
Applicant’s NIF (Tax ID)
-
Power of attorney (if company)
-
Representative’s authorisation
-
Bank account details
-
Declarations regarding:
-
Paid fees
-
Document authenticity
-
Other aid received
-
-
Programme-specific supporting documents (national or international)
What’s new in 2025?
While the overall structure remains similar to 2024, the 2025 call includes some important updates:
– Greater clarity on who should file the application when fees are paid by a company
– Stricter requirements for proving signing authority
– Alignment with the new Strategic Plan 2025–2027 of the Ministry of Industry
– Updated compliance with the EU de minimis regulation (December 2023)
Why should you apply?
Because patenting is expensive, and this grant allows you to reduce the financial burden of protecting your innovations—whether in Spain or abroad. It’s especially relevant for:
-
Tech startups
-
R&D centres and spin-offs
-
Independent inventors
-
Innovative SMEs
Want to know if you’re eligible?
Our firm can assist you with:
– Verifying eligibility criteria
– Estimating your potential reimbursement
– Preparing and submitting the application
– Properly documenting all expenses
Contact us—we’ll advise you with no obligation.